| Characteristic: | High Capacitance |
|---|---|
| Protection: | Resistance to Corrosion |
| Usage: | Electronics |
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Tantalum cannot be processed using ordinary methods for processing general metals. The initial process is usually forging and heat treatment,
Produce flat billets or small circular billets using two methods: hammering and stamping. Unlike general metals, tantalum cannot be hot worked. The recrystallization temperature of tantalum exceeds 1000~C. If heated, even with a general protective layer, excessive oxidation will occur. What's more serious is that if tantalum is exposed to such high temperatures, not only does it undergo excessive oxidation on the surface of tantalum, but oxygen can also invade between the atoms inside the matrix, making tantalum brittle. Not only oxygen, but also nitrogen, carbon, and hydrogen can make tantalum brittle. Due to the above reasons, tantalum is generally not subjected to hot processing. When hot processing is necessary, a protective covering layer should be applied or carried out in an inert gas atmosphere.
Heat treatment
Due to the active reaction between tantalum and oxygen, it is necessary to avoid conducting it in an atmosphere even with a small amount of air
Heat treatment. Therefore, almost all annealing is carried out in a high vacuum, and the airtightness of the heating furnace must also be high. Usually, the heat treatment temperature of tantalum is between 950~1300 ºC. Tantalum and commonly used tantalum alloys do not undergo phase transformation within this temperature range. Heat treatment is only used for annealing, so heating temperature and cooling rate are not important. To generate complete recrystallization, it is better to extend the heat treatment time slightly.
Commercial production of tantalum has high purity. By annealing, the grains become very large. The size of crystalline particles is determined by cold processing, purity, temperature, and process steps. Therefore, temperature control and process control are important means to determine the size of crystals.
Tantalum is different from many other metals and must be very clean before heat treatment. If not cleaned very thoroughly, surface contamination caused by hydrogen, oxygen, nitrogen, and carbon can occur, resulting in brittle (hardened) tissue. Because hydrogen, oxygen, nitrogen, and carbon are very active intrusive elements within the temperature range of tantalum annealing, once contaminated by these elements, there is no other way to remove them except by remelting.
| Materials | Pure Ta, Ta2.5W , TaNb alloy , Ta10W,Nb,etc |
| Dia | 1.0 - 200 mm |
| Wall Thickness | 0.2-20mm |
| Length | 5-12000mm |
| Wall thickness tolerance | ±5% |
| NTD test | Water pressure test, eddy current test , helium leak test |
| Standard | ASTM ,PED, GB/T |
| Destructive testing | Flattening, expanding, high and low temperature stretching |
Rich in ductility, low coefficient of thermal expansion, strong toughness
Extremely high corrosion resistance
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